Growth of high quality and conformal titanium nitride by thermal atomic layer deposition

PI: Nicholas Strandwitz

University: Lehigh University

Industry partner: Kurt J. Lesker Co.

In this study we will develop the growth process for titanium nitride grown by thermal atomic layer deposition.  This material is highly useful in a wide range of electronic and wear-resistant applications and the ability to deposit high quality and conformal films is lacking.  Films will be grown at the Kurt J. Lesker Company and analyzed at Lehigh.  Regular meetings will ensure good exchange of information and processing/analysis of results. The project will yield high quality, conformal TiN films and important relationships between the growth process and resulting film properties.